Advances in MoS2-Based Field Effect Transistors (FETs)
نویسندگان
چکیده
منابع مشابه
Energetic mapping of oxide traps in MoS2 field-effect transistors
The performance of MoS2 transistors is strongly affected by charge trapping in oxide traps with very broad distributions of time constants. These defects degrade the mobility and additionally lead to the hysteresis of the gate transfer characteristics, which presents a crucial performance and reliability issue for these new technologies. Here we perform a detailed study of the hysteresis in dou...
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S. Fathipour, M. Remskar, A. Varlec, A. Ajoy, R. Yan, S. Vishwanath, S. Rouvimov, W. S. Hwang, H. G. Xing, D. Jena, and A. Seabaugh Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA Solid State Physics Department, Jo!zef Stefan Institute, Ljubljana, Slovenia Department of Electrical Engineering, Cornell University, Ithaca, New York 14850, USA Departm...
متن کاملMoS2 Field-Effect Transistors With Graphene/Metal Heterocontacts
For the first time, n-type few-layer MoS2 fieldeffect transistors (FETs) with graphene/Ti as the heterocontacts have been fabricated, showing more than 160-mA/mm drain current at 1-μm gate length with an ON-OFF current ratio of 107. The enhanced electrical characteristic is confirmed in a nearly 2.1 times improvement in ON-resistance and a 3.3 times improvement in contact resistance with hetero...
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ژورنال
عنوان ژورنال: Nano-Micro Letters
سال: 2015
ISSN: 2311-6706,2150-5551
DOI: 10.1007/s40820-015-0034-8